Dr. Ir. F.D. Tichelaar (Frans)

Researcher

Room: B 213
Phone: + 31 15 27 82252
E-mail: f.d.tichelaar@tudelft.nl

Manager of facility, education of new users, TEM application specialist working on various projects and collaborations. Techniques used in the collaborations include:

Selected publications

Rath, JK, Schropp, REI, Cabarocas, PRI, P, Tichelaar FD, Thin film silicon devices deposited at 100 degrees C: A study on the structural order of the photoactive layer, Journal of non-crystalline solids, 354, 2008, 2652-2656

Lodhi, ZF, Tichelaar, FD, Kwakemaak, C, Mol, JMC, Terryn, H, de Wit, JHW; A combined composition. and morphology study of electrodeposited Zn-Co and Zn-Co-Fe alloy coatings, Surface & coatings technology 202, 2008, 2755-2764

Zijlstra, T, Lodewijk, CFJ, Vercruyssen, N, Tichelaar, FD, Loudkov, DN, Klapwijk, TM; Epitaxial aluminum nitride tunnel barriers grown by nitridation with a plasma source, Applied Physics Letters 91, 2007, 233102

van Elzakker, G, Sutta, P, Tichelaar, FD , Zeman M; Phase control and stability of thin silicon films deposited from silane diluted with hydrogen, Conference Information: Symposium on Amorphous and Polycrystalline Thin-Film Silicon Science and Technology held at the 2007 MRS Spring Meeting, Amorphous and Polycrystalline Thin-Film Silicon Science and Technology 989, 2007, 179-184

Voogt FC, Ishihara R, Tichelaar FD, J. Appl. Phys. 95 (2004) 2873-2879

A. P.D. Thang, E. Brüch, F.D. Tichelaar, K.H.J. Buschow, and F.R. de Boer, IEEE Transactions on Magnetics 38 (2002) 2934-2936

N. C. F. Groot, J. Dik, G. van der Kooij, P. F. A. Alkemade, v. G. M. Sivel and f. D. Tichelaar, Archaeometry 48, 2 (2006) 229–236

L.T. Nguyen, F.D. Tichelaar, and J.C. Lodder, J. of Magnetism and magnetic materials 290-291 (2005) 1294-1297

R. Pantel, M. C. Cheynet and F.D. Tichelaar, MICRON 657-665, 2006

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